Aluminum nitride/ air-gap structures fabricated via selective wet chemical etching
Aluminum nitride/air-gap structures were fabricated via selective wet chemical etching by removing the sacrificial aluminum layers from the Al/AlN superlattice. Five pairs of alternating Al and AlN layers were deposited on silicon and glass substrates using reactive magnetron sputtering. Scanning el...
| Príomhchruthaitheoir: | |
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| Rannpháirtithe: | |
| Formáid: | Tráchtas |
| Teanga: | English |
| Foilsithe / Cruthaithe: |
Quezon City
National Institute of Physics, College of Science, University of the Philippines Diliman
2013.
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| Ábhair: |