Aluminum nitride/ air-gap structures fabricated via selective wet chemical etching
Aluminum nitride/air-gap structures were fabricated via selective wet chemical etching by removing the sacrificial aluminum layers from the Al/AlN superlattice. Five pairs of alternating Al and AlN layers were deposited on silicon and glass substrates using reactive magnetron sputtering. Scanning el...
| Autor Principal: | |
|---|---|
| Outros autores: | |
| Formato: | Thesis |
| Idioma: | English |
| Publicado: |
Quezon City
National Institute of Physics, College of Science, University of the Philippines Diliman
2013.
|
| Subjects: |