Aluminum nitride/ air-gap structures fabricated via selective wet chemical etching

Aluminum nitride/air-gap structures were fabricated via selective wet chemical etching by removing the sacrificial aluminum layers from the Al/AlN superlattice. Five pairs of alternating Al and AlN layers were deposited on silicon and glass substrates using reactive magnetron sputtering. Scanning el...

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Detalles Bibliográficos
Autor principal: Abat, Jonathan Ray R. (Autor)
Otros Autores: Somintac, Armand S. (adviser.)
Formato: Tesis
Lenguaje:English
Publicado: Quezon City National Institute of Physics, College of Science, University of the Philippines Diliman 2013.
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