Parametric and kinetic study of silicon nitride film deposition on silicon wafer by low pressure chemical vapor deposition (LPCVD) method

Parametric and kinetic study of silicon nitride film deposition on silicon wafer by low pressure chemical vapor deposition (LPCVD) method

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Bibliographic Details
Main Author: Velasco, Angelito A.
Format: Thesis
Language:English
Published: 2002.
Subjects:
Silicon nitride.
Chemical vapor deposition.
Arrhenius equation.