High vacuum thermal oxidation of RF magnetron sputtered aluminum film on copper substrate for TBC-AL203 growth

High vacuum thermal oxidation of RF magnetron sputtered aluminum film on copper substrate for TBC-AL203 growth

Detaylı Bibliyografya
Yazar: Garcia, Alipio Terrano
Materyal Türü: Tez
Dil:English
Baskı/Yayın Bilgisi: 1999.
Konular:
Sputtering (Physics).
Aluminum films.
Copper > Oxidation.
Aluminum > Anodic oxidation.