High vacuum thermal oxidation of RF magnetron sputtered aluminum film on copper substrate for TBC-AL203 growth

High vacuum thermal oxidation of RF magnetron sputtered aluminum film on copper substrate for TBC-AL203 growth

Bibliografiska uppgifter
Huvudupphovsman: Garcia, Alipio Terrano
Materialtyp: Lärdomsprov
Språk:English
Publicerad: 1999.
Ämnen:
Sputtering (Physics).
Aluminum films.
Copper > Oxidation.
Aluminum > Anodic oxidation.