High vacuum thermal oxidation of RF magnetron sputtered aluminum film on copper substrate for TBC-AL203 growth

Detalhes bibliográficos
Autor principal:	Garcia, Alipio Terrano
Formato:	Thesis
Idioma:	English
Publicado em:	1999.
Assuntos:	Sputtering (Physics). Aluminum films. Copper > Oxidation. Aluminum > Anodic oxidation.