High vacuum thermal oxidation of RF magnetron sputtered aluminum film on copper substrate for TBC-AL203 growth

High vacuum thermal oxidation of RF magnetron sputtered aluminum film on copper substrate for TBC-AL203 growth

Opis bibliograficzny
1. autor: Garcia, Alipio Terrano
Format: Praca dyplomowa
Język:English
Wydane: 1999.
Hasła przedmiotowe:
Sputtering (Physics).
Aluminum films.
Copper > Oxidation.
Aluminum > Anodic oxidation.