High vacuum thermal oxidation of RF magnetron sputtered aluminum film on copper substrate for TBC-AL203 growth

High vacuum thermal oxidation of RF magnetron sputtered aluminum film on copper substrate for TBC-AL203 growth

Sonraí bibleagrafaíochta
Príomhchruthaitheoir: Garcia, Alipio Terrano
Formáid: Tráchtas
Teanga:English
Foilsithe / Cruthaithe: 1999.
Ábhair:
Sputtering (Physics).
Aluminum films.
Copper > Oxidation.
Aluminum > Anodic oxidation.