High vacuum thermal oxidation of RF magnetron sputtered aluminum film on copper substrate for TBC-AL203 growth

Détails bibliographiques
Auteur principal:	Garcia, Alipio Terrano
Format:	Thèse
Langue:	English
Publié:	1999.
Sujets:	Sputtering (Physics). Aluminum films. Copper > Oxidation. Aluminum > Anodic oxidation.