High vacuum thermal oxidation of RF magnetron sputtered aluminum film on copper substrate for TBC-AL203 growth

High vacuum thermal oxidation of RF magnetron sputtered aluminum film on copper substrate for TBC-AL203 growth

Xehetasun bibliografikoak
Egile nagusia: Garcia, Alipio Terrano
Formatua: Thesis
Hizkuntza:English
Argitaratua: 1999.
Gaiak:
Sputtering (Physics).
Aluminum films.
Copper > Oxidation.
Aluminum > Anodic oxidation.