High vacuum thermal oxidation of RF magnetron sputtered aluminum film on copper substrate for TBC-AL203 growth

Detalles Bibliográficos
Autor principal:	Garcia, Alipio Terrano
Formato:	Tesis
Lenguaje:	English
Publicado:	1999.
Materias:	Sputtering (Physics). Aluminum films. Copper > Oxidation. Aluminum > Anodic oxidation.