High vacuum thermal oxidation of RF magnetron sputtered aluminum film on copper substrate for TBC-AL203 growth

High vacuum thermal oxidation of RF magnetron sputtered aluminum film on copper substrate for TBC-AL203 growth

Bibliographische Detailangaben
1. Verfasser: Garcia, Alipio Terrano
Format: Abschlussarbeit
Sprache:English
Veröffentlicht: 1999.
Schlagworte:
Sputtering (Physics).
Aluminum films.
Copper > Oxidation.
Aluminum > Anodic oxidation.