High vacuum thermal oxidation of RF magnetron sputtered aluminum film on copper substrate for TBC-AL203 growth

High vacuum thermal oxidation of RF magnetron sputtered aluminum film on copper substrate for TBC-AL203 growth

Manylion Llyfryddiaeth
Prif Awdur: Garcia, Alipio Terrano
Fformat: Traethawd Ymchwil
Iaith:English
Cyhoeddwyd: 1999.
Pynciau:
Sputtering (Physics).
Aluminum films.
Copper > Oxidation.
Aluminum > Anodic oxidation.