High vacuum thermal oxidation of RF magnetron sputtered aluminum film on copper substrate for TBC-AL203 growth

Dades bibliogràfiques
Autor principal:	Garcia, Alipio Terrano
Format:	Thesis
Idioma:	English
Publicat:	1999.
Matèries:	Sputtering (Physics). Aluminum films. Copper > Oxidation. Aluminum > Anodic oxidation.