Etch-stop mechanisms in plasma-assisted atomic layer etching of silicon nitride: a molecular dynamics study

Etch-stop mechanisms in plasma-assisted atomic layer etching of silicon nitride: a molecular dynamics study

Bibliografiske detaljer
Hovedforfatter: Tercero, Jomar U. (Author)
Andre forfattere: Vasquez, Magdaleno R. Jr (adviser.), Hamaguchi, Satoshi (co-adviser.)
Format: Thesis
Sprog:English
Udgivet: Quezon City College of Engineering, University of the Philippines Diliman 2021.
Fag:
Molecular dynamics simulations.
Silicon nitride.
Online adgang:Abstract