Aluminum nitride/ air-gap structures fabricated via selective wet chemical etching

Aluminum nitride/air-gap structures were fabricated via selective wet chemical etching by removing the sacrificial aluminum layers from the Al/AlN superlattice. Five pairs of alternating Al and AlN layers were deposited on silicon and glass substrates using reactive magnetron sputtering. Scanning el...

詳細記述

書誌詳細
第一著者: Abat, Jonathan Ray R. (著者)
その他の著者: Somintac, Armand S. (adviser.)
フォーマット: 学位論文
言語:English
出版事項: Quezon City National Institute of Physics, College of Science, University of the Philippines Diliman 2013.
主題: