Velasco, A. A. Parametric and kinetic study of silicon nitride film deposition on silicon wafer by low pressure chemical vapor deposition (LPCVD) Method. Philippine Engineering Journal.
Chicago-referens (17:e uppl.)Velasco, Angelito A. "Parametric and Kinetic Study of Silicon Nitride Film Deposition on Silicon Wafer by Low Pressure Chemical Vapor Deposition (LPCVD) Method." Philippine Engineering Journal .
MLA-referens (9:e uppl.)Velasco, Angelito A. "Parametric and Kinetic Study of Silicon Nitride Film Deposition on Silicon Wafer by Low Pressure Chemical Vapor Deposition (LPCVD) Method." Philippine Engineering Journal, .
Varning: dessa hänvisningar är inte alltid fullständigt riktiga.