Obálka

Photopolymers photoresist materials, processes, and applications

Podrobná bibliografie
Hlavní autor: Nakamura, Kenichiro (Chemical engineer) (Autor)
Médium: Electronic Resource
Jazyk:angličtina
Vydáno: Boca Raton CRC Press [2015]
Edice:Optics and photonics (Boca Raton, Fla.) 10.
Témata:
Photopolymers.
Photoresists.
Photopolymerization.
Photopolymers > Industrial applications.
Microelectronics > Materials.
Electronic books.
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