Fs pulsed laser (785nm) deposition of nd yag film on silicon substrate
Neodymium doped yttrium aluminum garnet (Nd:YAG) is deposited on silicon (100) substrate through pulsed laser deposition. The excitation source used in ablating the Nd:YAG target to create the deposition flux is a 500 mW mode-locked femtosecond Ti:Sapphire laser set at a wavelength λ=785 nm with an...
| 主要作者: | |
|---|---|
| 格式: | Thesis |
| 語言: | English |
| 出版: |
2011.
|
| 主題: |