Fs pulsed laser (785nm) deposition of nd yag film on silicon substrate
Neodymium doped yttrium aluminum garnet (Nd:YAG) is deposited on silicon (100) substrate through pulsed laser deposition. The excitation source used in ablating the Nd:YAG target to create the deposition flux is a 500 mW mode-locked femtosecond Ti:Sapphire laser set at a wavelength λ=785 nm with an...
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| Formatua: | Thesis |
| Hizkuntza: | English |
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2011.
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