Fs pulsed laser (785nm) deposition of nd yag film on silicon substrate
Neodymium doped yttrium aluminum garnet (Nd:YAG) is deposited on silicon (100) substrate through pulsed laser deposition. The excitation source used in ablating the Nd:YAG target to create the deposition flux is a 500 mW mode-locked femtosecond Ti:Sapphire laser set at a wavelength λ=785 nm with an...
| मुख्य लेखक: | |
|---|---|
| स्वरूप: | थीसिस |
| भाषा: | English |
| प्रकाशित: |
2011.
|
| विषय: |