Velasco, A. A. Parametric and Kinetic Study of Silicon Nitride Film Deposition on Silicon Wafer by Low Pressure Chemical Vapor Deposition (LPCVD) Method. Philippine Engineering Journal.
Chicago Style (17th ed.) CitationVelasco, Angelito A. "Parametric and Kinetic Study of Silicon Nitride Film Deposition on Silicon Wafer by Low Pressure Chemical Vapor Deposition (LPCVD) Method." Philippine Engineering Journal .
MLA (9th ed.) CitationVelasco, Angelito A. "Parametric and Kinetic Study of Silicon Nitride Film Deposition on Silicon Wafer by Low Pressure Chemical Vapor Deposition (LPCVD) Method." Philippine Engineering Journal, .
Warning: These citations may not always be 100% accurate.