Characterization of aluminum films deposited on silicon substrate by radio frequency (RF) magnetron sputtering
A study made to determine the characteristics of aluminum thin films deposited on type (lll) silicon (Si) substrate using Radio Frequency (RF) magnetron Sputtering at different operating conditions. The parameters studied include the RF power, deposition time (DT) and operating pressure (OP). The RF...
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| Aineistotyyppi: | Opinnäyte |
| Kieli: | English |
| Julkaistu: |
1999.
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