Bufler, F. Scaling of strained-Si n-MOSFETs into the ballistic regime and associated anisotropic effects. IEEE Transactions on electron devices.
Cita Chicago (17th ed.)Bufler, F.M. "Scaling of Strained-Si N-MOSFETs into the Ballistic Regime and Associated Anisotropic Effects." IEEE Transactions on Electron Devices .
Cita MLA (9th ed.)Bufler, F.M. "Scaling of Strained-Si N-MOSFETs into the Ballistic Regime and Associated Anisotropic Effects." IEEE Transactions on Electron Devices, .
Atenció: Aquestes cites poden no estar 100% correctes.