A new role for e-beam electron projection.
In the Scalpel system, a wide beam of electrons replaces light as the means of wafer exposure, and throughput is aided by a step-and-scan approach. One of the leading candidates for next generation lithography is Scalpel, which stands for scattering with angular limitation projection electron-beam l...
| में प्रकाशित: | IEEE spectrum 36, 7 (1999). |
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| मुख्य लेखक: | |
| स्वरूप: | लेख |
| भाषा: | अंग्रेज़ी |
| विषय: |