Process and circuit design interlock for application-dependent scaling tradeoffs and optimization in the SoC era.

Several physical phenomena in highly scaled CMOS technology have now become first-order elements affecting the electrical behavior of transistor characteristics. Effects such as STI mechanical stress, direct tunneling in gate dielectrics, gate line-edge roughness, and others can have significant inf...

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التفاصيل البيبلوغرافية
الحاوية / القاعدة:IEEE Journal of solid state circuits 38, 3 (2003).
المؤلف الرئيسي: Diaz, C.H
التنسيق: مقال
اللغة:English
الموضوعات: