Velasco, A. A. (2002). Parametric and kinetic study of silicon nitride film deposition on silicon wafer by low pressure chemical vapor deposition (LPCVD) method.
शिकागो शैली (17वां संस्करण) प्रशस्ति पत्रVelasco, Angelito A. Parametric and Kinetic Study of Silicon Nitride Film Deposition on Silicon Wafer by Low Pressure Chemical Vapor Deposition (LPCVD) Method. 2002.
एमएलए (9वां संस्करण) प्रशस्ति पत्रVelasco, Angelito A. Parametric and Kinetic Study of Silicon Nitride Film Deposition on Silicon Wafer by Low Pressure Chemical Vapor Deposition (LPCVD) Method. 2002.
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