Chemical vapor deposition thermal and plasma deposition of electronic materials

Chemical vapor deposition thermal and plasma deposition of electronic materials

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Dades bibliogràfiques
Autor principal: Sivaram, S.
Format: Llibre
Idioma:English
Publicat: N.Y. Van Nostrand Reinhold c1995.
Matèries:
Microelectronics industry.
Chemical vapor deposition.
Microelectronics > Materials.