Chemical vapour deposition of tungsten from WF6/SiH4 and WF8/GeH4

Chemical vapour deposition of tungsten from WF6/SiH4 and WF8/GeH4

Detalhes bibliográficos
Autor principal: Van der Jeugd, Cornelius Alexander
Formato: Livro
Idioma:English
Publicado em: [Netherlands Delft University] 1992.
Assuntos:
Vapor-plating.