High vacuum thermal oxidation of RF magnetron sputtered aluminum film on copper substrate for TBC-AL203 growth

High vacuum thermal oxidation of RF magnetron sputtered aluminum film on copper substrate for TBC-AL203 growth

Podrobná bibliografie
Hlavní autor: Garcia, Alipio Terrano
Médium: Diplomová práce
Jazyk:English
Vydáno: 1999.
Témata:
Sputtering (Physics).
Aluminum films.
Copper > Oxidation.
Aluminum > Anodic oxidation.