Garcia, A. T. (1999). High vacuum thermal oxidation of RF magnetron sputtered aluminum film on copper substrate for TBC-AL203 growth.
Chicago Style (17th ed.) CitationGarcia, Alipio Terrano. High Vacuum Thermal Oxidation of RF Magnetron Sputtered Aluminum Film on Copper Substrate for TBC-AL203 Growth. 1999.
ציטוט MLAGarcia, Alipio Terrano. High Vacuum Thermal Oxidation of RF Magnetron Sputtered Aluminum Film on Copper Substrate for TBC-AL203 Growth. 1999.
אזהרה: ציטוטים אלה לעיתים לא מדויקים ב 100%.