Garcia, A. T. (1999). High vacuum thermal oxidation of RF magnetron sputtered aluminum film on copper substrate for TBC-AL203 growth.
Citación estilo ChicagoGarcia, Alipio Terrano. High Vacuum Thermal Oxidation of RF Magnetron Sputtered Aluminum Film on Copper Substrate for TBC-AL203 Growth. 1999.
Cita MLAGarcia, Alipio Terrano. High Vacuum Thermal Oxidation of RF Magnetron Sputtered Aluminum Film on Copper Substrate for TBC-AL203 Growth. 1999.
Warning: These citations may not always be 100% accurate.