Garcia, A. T. (1999). High vacuum thermal oxidation of RF magnetron sputtered aluminum film on copper substrate for TBC-AL203 growth.
Cita Chicago (17th ed.)Garcia, Alipio Terrano. High Vacuum Thermal Oxidation of RF Magnetron Sputtered Aluminum Film on Copper Substrate for TBC-AL203 Growth. 1999.
Cita MLA (9th ed.)Garcia, Alipio Terrano. High Vacuum Thermal Oxidation of RF Magnetron Sputtered Aluminum Film on Copper Substrate for TBC-AL203 Growth. 1999.
Atenció: Aquestes cites poden no estar 100% correctes.