Etch-stop mechanisms in plasma-assisted atomic layer etching of silicon nitride: a molecular dynamics study

Etch-stop mechanisms in plasma-assisted atomic layer etching of silicon nitride: a molecular dynamics study

Bibliografische gegevens
Hoofdauteur: Tercero, Jomar U. (Auteur)
Andere auteurs: Vasquez, Magdaleno R. Jr (adviser.), Hamaguchi, Satoshi (co-adviser.)
Formaat: Thesis
Taal:English
Gepubliceerd in: Quezon City College of Engineering, University of the Philippines Diliman 2021.
Onderwerpen:
Molecular dynamics simulations.
Silicon nitride.
Online toegang:Abstract