Etch-stop mechanisms in plasma-assisted atomic layer etching of silicon nitride: a molecular dynamics study

Etch-stop mechanisms in plasma-assisted atomic layer etching of silicon nitride: a molecular dynamics study

Detalles Bibliográficos
Autor Principal: Tercero, Jomar U. (Author)
Outros autores: Vasquez, Magdaleno R. Jr (adviser.), Hamaguchi, Satoshi (co-adviser.)
Formato: Thesis
Idioma:English
Publicado: Quezon City College of Engineering, University of the Philippines Diliman 2021.
Subjects:
Molecular dynamics simulations.
Silicon nitride.
Acceso en liña:Abstract