Etch-stop mechanisms in plasma-assisted atomic layer etching of silicon nitride: a molecular dynamics study

Etch-stop mechanisms in plasma-assisted atomic layer etching of silicon nitride: a molecular dynamics study

Detalhes bibliográficos
Autor principal: Tercero, Jomar U. (Author)
Outros Autores: Vasquez, Magdaleno R. Jr (adviser.), Hamaguchi, Satoshi (co-adviser.)
Formato: Thesis
Idioma:English
Publicado em: Quezon City College of Engineering, University of the Philippines Diliman 2021.
Assuntos:
Molecular dynamics simulations.
Silicon nitride.
Acesso em linha:Abstract