Etch-stop mechanisms in plasma-assisted atomic layer etching of silicon nitride: a molecular dynamics study

Etch-stop mechanisms in plasma-assisted atomic layer etching of silicon nitride: a molecular dynamics study

書目詳細資料
主要作者: Tercero, Jomar U. (Author)
其他作者: Vasquez, Magdaleno R. Jr (adviser.), Hamaguchi, Satoshi (co-adviser.)
格式: Thesis
語言:English
出版: Quezon City College of Engineering, University of the Philippines Diliman 2021.
主題:
Molecular dynamics simulations.
Silicon nitride.
在線閱讀:Abstract