Cita APA (7th ed.)

Tercero, J. U., Vasquez, M. R. J., & Hamaguchi, S. (2021). Etch-stop mechanisms in plasma-assisted atomic layer etching of silicon nitride: A molecular dynamics study. College of Engineering, University of the Philippines Diliman.

Cita Chicago (17th ed.)

Tercero, Jomar U., Magdaleno R. Jr Vasquez, i Satoshi Hamaguchi. Etch-stop Mechanisms in Plasma-assisted Atomic Layer Etching of Silicon Nitride: A Molecular Dynamics Study. Quezon City: College of Engineering, University of the Philippines Diliman, 2021.

Cita MLA (9th ed.)

Tercero, Jomar U., et al. Etch-stop Mechanisms in Plasma-assisted Atomic Layer Etching of Silicon Nitride: A Molecular Dynamics Study. College of Engineering, University of the Philippines Diliman, 2021.

Atenció: Aquestes cites poden no estar 100% correctes.