Glow discharge polymerization of porous polyaniline film on argon sputtered silicon (100)
This paper explores the formation of porous polyaniline film on modified silicon substrate by plasma-induced polymerization of monomer precursor aniline. Silicon surface was sputtered with argon plasma to form a porous layer. Aniline was introduced into the chamber and deposited on the silicon surfa...
| Cyhoeddwyd yn: | UP Los Baños Journal Vol. VIII (Jan. 2010 - Dec. 2010), figures ; 183-193 |
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| Prif Awdur: | |
| Awduron Eraill: | , |
| Fformat: | Erthygl |
| Cyhoeddwyd: |
2010
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| Pynciau: |