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    Parametric and kinetic study of silicon nitride film deposition on silicon wafer by Low Pressure Chemical Vapor Deposition (LPCVD) method by Velasco, Angelito A.

    Published in Philippine Engineering Journal (2002)
    Article

    Parametric and kinetic study of silicon nitride film deposition on silicon wafer by Low Pressure Chemical Vapor Deposition (LPCVD) method

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