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Parametric and kinetic study of silicon nitride film deposition on silicon wafer by low pressure chemical vapor deposition (LPCVD) method
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Velasco, Angelito A.
Published 2002
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More pitfalls of accelerated tests.
by
Meeker, William Q.
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Journal of Quality Technology
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CAMPUS
Diliman
1 results
1
DATABASE
Union Catalog (Buklod)
2 results
2
UNIT LIBRARY
College of Engineering Library II
1 results
1
Diliman Main Library: University Archives
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CLASSIFICATION
L - Education
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SUBJECT
Arrhenius equation
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Chemical vapor deposition
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Silicon nitride
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1
AUTHOR
Meeker, William Q.
1 results
1
Velasco, Angelito A.
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1
RESOURCE TYPE
Article
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1
Thesis
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1
LANGUAGE
English
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