Mostrar 1 - 1 resultats de 1 per cerca '"Arrhenius equation."', hora de la petició: 0.01sec Refinar resultats
  1. 1

    Parametric and kinetic study of silicon nitride film deposition on silicon wafer by low pressure chemical vapor deposition (LPCVD) method per Velasco, Angelito A.

    Publicat 2002
    Thesis

    Parametric and kinetic study of silicon nitride film deposition on silicon wafer by low pressure chemical vapor deposition (LPCVD) method

Eines de cerca: