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  1. 1

    Color control of decorative titanium nitride-based coatings prepared by magnetron sputtering 著者: Ontoria, Aian B.

    出版事項 2020
    Abstract
    学位論文

    Color control of decorative titanium nitride-based coatings prepared by magnetron sputtering
  2. 2

    Effects of copper negative ion beam on ceramic substrates via plasma sputter-type negative ion source 著者: Galban, Nescy Leann F.

    出版事項 2014
    全文の入手
    学位論文

    Effects of copper negative ion beam on ceramic substrates via plasma sputter-type negative ion source
  3. 3

    Production of Au, Nb, and Si ions using a sputter-type negative ion source 著者: Ulano, April M.

    出版事項 2012
    学位論文

    Production of Au, Nb, and Si ions using a sputter-type negative ion source
  4. 4

    High vacuum thermal oxidation of RF magnetron sputtered aluminum film on copper substrate for TBC-AL203 growth 著者: Garcia, Alipio Terrano

    出版事項 1999
    学位論文

    High vacuum thermal oxidation of RF magnetron sputtered aluminum film on copper substrate for TBC-AL203 growth
  5. 5

    Characterization of aluminum films deposited on silicon substrate by radio frequency (RF) magnetron sputtering 著者: Flauta, Randolph E.

    出版事項 1999
    学位論文

    Characterization of aluminum films deposited on silicon substrate by radio frequency (RF) magnetron sputtering
  6. 6

    Energetic charged-particle interactions with atmospheres and surfaces. 著者: Johnson, R. E.

    出版事項 1990
    図書

    Energetic charged-particle interactions with atmospheres and surfaces.
  7. 7

    Glow discharge processes sputtering and plasma etching 著者: Chapman, Brian N.

    出版事項 1980
    図書

    Glow discharge processes sputtering and plasma etching
  8. 8

    Titanium nitride (TiN) thin films grown by DC/RF planar magnetron sputtering 著者: Absin, Rex S.

    図書

    Titanium nitride (TiN) thin films grown by DC/RF planar magnetron sputtering

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