Color control of decorative titanium nitride-based coatings prepared by magnetron sputtering de réir Ontoria, Aian B.

Abstract

Effects of copper negative ion beam on ceramic substrates via plasma sputter-type negative ion source de réir Galban, Nescy Leann F.

Faigh an téacs iomlán

Production of Au, Nb, and Si ions using a sputter-type negative ion source de réir Ulano, April M.

High vacuum thermal oxidation of RF magnetron sputtered aluminum film on copper substrate for TBC-AL203 growth de réir Garcia, Alipio Terrano

Characterization of aluminum films deposited on silicon substrate by radio frequency (RF) magnetron sputtering de réir Flauta, Randolph E.

Energetic charged-particle interactions with atmospheres and surfaces. de réir Johnson, R. E.

Glow discharge processes sputtering and plasma etching de réir Chapman, Brian N.

Titanium nitride (TiN) thin films grown by DC/RF planar magnetron sputtering de réir Absin, Rex S.