Color control of decorative titanium nitride-based coatings prepared by magnetron sputtering Tekijä Ontoria, Aian B.

Abstract

Effects of copper negative ion beam on ceramic substrates via plasma sputter-type negative ion source Tekijä Galban, Nescy Leann F.

Hae kokoteksti

Production of Au, Nb, and Si ions using a sputter-type negative ion source Tekijä Ulano, April M.

High vacuum thermal oxidation of RF magnetron sputtered aluminum film on copper substrate for TBC-AL203 growth Tekijä Garcia, Alipio Terrano

Characterization of aluminum films deposited on silicon substrate by radio frequency (RF) magnetron sputtering Tekijä Flauta, Randolph E.

Energetic charged-particle interactions with atmospheres and surfaces. Tekijä Johnson, R. E.

Glow discharge processes sputtering and plasma etching Tekijä Chapman, Brian N.

Titanium nitride (TiN) thin films grown by DC/RF planar magnetron sputtering Tekijä Absin, Rex S.