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Color control of decorative titanium nitride-based coatings prepared by magnetron sputtering
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Ontoria, Aian B.
Udgivet 2020
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Effects of copper negative ion beam on ceramic substrates via plasma sputter-type negative ion source
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Galban, Nescy Leann F.
Udgivet 2014
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Production of Au, Nb, and Si ions using a sputter-type negative ion source
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Ulano, April M.
Udgivet 2012
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High vacuum thermal oxidation of RF magnetron sputtered aluminum film on copper substrate for TBC-AL203 growth
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Garcia, Alipio Terrano
Udgivet 1999
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Characterization of aluminum films deposited on silicon substrate by radio frequency (RF) magnetron sputtering
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Flauta, Randolph E.
Udgivet 1999
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Energetic charged-particle interactions with atmospheres and surfaces.
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Johnson, R. E.
Udgivet 1990
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Glow discharge processes sputtering and plasma etching
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Chapman, Brian N.
Udgivet 1980
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Titanium nitride (TiN) thin films grown by DC/RF planar magnetron sputtering
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Absin, Rex S.
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