Color control of decorative titanium nitride-based coatings prepared by magnetron sputtering حسب Ontoria, Aian B.

Abstract

Effects of copper negative ion beam on ceramic substrates via plasma sputter-type negative ion source حسب Galban, Nescy Leann F.

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Production of Au, Nb, and Si ions using a sputter-type negative ion source حسب Ulano, April M.

High vacuum thermal oxidation of RF magnetron sputtered aluminum film on copper substrate for TBC-AL203 growth حسب Garcia, Alipio Terrano

Characterization of aluminum films deposited on silicon substrate by radio frequency (RF) magnetron sputtering حسب Flauta, Randolph E.

Energetic charged-particle interactions with atmospheres and surfaces. حسب Johnson, R. E.

Glow discharge processes sputtering and plasma etching حسب Chapman, Brian N.

Titanium nitride (TiN) thin films grown by DC/RF planar magnetron sputtering حسب Absin, Rex S.