Dry etching technology for semiconductors por Nojiri, Kazuo

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Formation of nanopillars on 4H-SiC via self-masking CF4 plasma etching in a gas disharge ion source por Gines, Arnold Rey B.

Reactive ion etching of GaAs structures using BCl3 por Mailig, Rengie Mark D.

Parametric study of the reactive ion etching of silicon por Sotto, Romelyn H.

Principles of plasma discharges and materials processing por Lieberman, M. A.

Plasma deposition, treatment, and etching of polymers the treatment and etching of polymers

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Plasma deposition, treatment, and etching of polymers. por D'Agostino, Riccardo

Plasma etching an introduction

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Plasma etching an introduction. por Manos, Dennis M.

Applications of plasma processes to VLSI technology