Dry etching technology for semiconductors 著者: Nojiri, Kazuo

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Formation of nanopillars on 4H-SiC via self-masking CF4 plasma etching in a gas disharge ion source 著者: Gines, Arnold Rey B.

Reactive ion etching of GaAs structures using BCl3 著者: Mailig, Rengie Mark D.

Parametric study of the reactive ion etching of silicon 著者: Sotto, Romelyn H.

Principles of plasma discharges and materials processing 著者: Lieberman, M. A.

Plasma deposition, treatment, and etching of polymers the treatment and etching of polymers

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Plasma deposition, treatment, and etching of polymers. 著者: D'Agostino, Riccardo

Plasma etching an introduction

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Plasma etching an introduction. 著者: Manos, Dennis M.

Applications of plasma processes to VLSI technology