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Formation of nanopillars on 4H-SiC via self-masking CF4 plasma etching in a gas disharge ion source
Veröffentlicht 2013Abschlussarbeit -
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Plasma deposition, treatment, and etching of polymers the treatment and etching of polymers
Veröffentlicht 1990Available for University of the Philippines System via ScienceDirect. Click here to access
Also available remotely for University of the Philippines System via ScienceDirect. Click here to access thru EZproxy
Electronic Resource -
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